標題: Effects of Hydrogen Plasma Treatment on Field-Emission Characteristics of Palladium Nanogap Emitters
作者: Tsai, Chih-Hao
Chen, Kuan-Jung
Pan, Fu-Ming
Lo, Hsiang-Yu
Li, Yiming
Chiang, Mei-Chao
Mo, Chi-Neng
材料科學與工程學系
電信工程研究所
Department of Materials Science and Engineering
Institute of Communications Engineering
公開日期: 2008
摘要: Nanogaps were prepared on the Pd line electrode by focused ion beam, and electron field-emission characteristics of the Pd nanogap emitter subject to hydrogen plasma treatment were studied. The as-prepared nanogap had smooth and uniform gap edges, and thus field-emission characteristics of the nanogap emitter were primarily dependent on the gap separation. After the hydrogen plasma treatment, the field-emission property of the Pd nanogap emitter was significantly enhanced. The improvement in the field-emission property was mainly attributed to formation of a ragged morphology on the nanogap emitter during the hydrogen plasma treatment. The ragged morphology provided more emitting sites with a high field enhancement factor. The Fowler-Nordheim plot was used to elucidate the dependence of field-emission characteristics of the Pd nanogap emitter on the plasma-induced ragged morphology. (C) 2008 The Electrochemical Society. [DOI: 10.1149/1.2988646] All rights reserved.
URI: http://hdl.handle.net/11536/9905
http://dx.doi.org/10.1149/1.2988646
ISSN: 0013-4651
DOI: 10.1149/1.2988646
期刊: JOURNAL OF THE ELECTROCHEMICAL SOCIETY
Volume: 155
Issue: 12
起始頁: J361
結束頁: J364
顯示於類別:期刊論文


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