Title: Mixed-metal oxide films via a heterobimetallic complex as an MOCVD single-source precursor
Authors: Shyu, SG
Wu, JS
Chuang, SH
Chi, KM
Sung, YS
應用化學系
Department of Applied Chemistry
Issue Date: 7-Oct-1996
Abstract: A single-phase polycrystalline mixed-metal oxide WCoO4 film on Si(100) can be prepared by MOCVD with the use of [(eta-C5H5)(CO)(3)WCo(CO)(4)] as a single-source precursor.
URI: http://dx.doi.org/10.1039/cc9960002239
http://hdl.handle.net/11536/982
ISSN: 1359-7345
DOI: 10.1039/cc9960002239
Journal: CHEMICAL COMMUNICATIONS
Volume: 
Issue: 19
Begin Page: 2239
End Page: 2240
Appears in Collections:Articles


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  1. A1996VM02300010.pdf