標題: Mixed-metal oxide films via a heterobimetallic complex as an MOCVD single-source precursor
作者: Shyu, SG
Wu, JS
Chuang, SH
Chi, KM
Sung, YS
應用化學系
Department of Applied Chemistry
公開日期: 7-十月-1996
摘要: A single-phase polycrystalline mixed-metal oxide WCoO4 film on Si(100) can be prepared by MOCVD with the use of [(eta-C5H5)(CO)(3)WCo(CO)(4)] as a single-source precursor.
URI: http://dx.doi.org/10.1039/cc9960002239
http://hdl.handle.net/11536/982
ISSN: 1359-7345
DOI: 10.1039/cc9960002239
期刊: CHEMICAL COMMUNICATIONS
Volume: 
Issue: 19
起始頁: 2239
結束頁: 2240
顯示於類別:期刊論文


文件中的檔案:

  1. A1996VM02300010.pdf