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dc.contributor.author林清發en_US
dc.contributor.authorLIN TSING-FAen_US
dc.date.accessioned2014-12-13T10:37:14Z-
dc.date.available2014-12-13T10:37:14Z-
dc.date.issued1999en_US
dc.identifier.govdocNSC88-2218-E009-001zh_TW
dc.identifier.urihttp://hdl.handle.net/11536/94464-
dc.identifier.urihttps://www.grb.gov.tw/search/planDetail?id=431210&docId=77294en_US
dc.description.sponsorship行政院國家科學委員會zh_TW
dc.language.isozh_TWen_US
dc.subjectLPCVD反應爐zh_TW
dc.subject薄膜成長zh_TW
dc.subject熱流設計zh_TW
dc.subjectLPCVD reactoren_US
dc.subjectThin film growthen_US
dc.subjectThermal fluid designen_US
dc.title8吋矽晶半導體LPCVD製程設備之研發---總計畫(III)zh_TW
dc.titleResearch and Development of LPCVD Process Equipment for Eight Inch Single Silicon Wafer (III)en_US
dc.typePlanen_US
dc.contributor.department交通大學機械工程系zh_TW
Appears in Collections:Research Plans


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