標題: 8吋矽晶半導體LPCVD製程設備之研發---總計畫(III)
Research and Development of LPCVD Process Equipment for Eight Inch Single Silicon Wafer (III)
作者: 林清發
LIN TSING-FA
交通大學機械工程系
關鍵字: LPCVD反應爐;薄膜成長;熱流設計;LPCVD reactor;Thin film growth;Thermal fluid design
公開日期: 1999
官方說明文件#: NSC88-2218-E009-001
URI: http://hdl.handle.net/11536/94464
https://www.grb.gov.tw/search/planDetail?id=431210&docId=77294
Appears in Collections:Research Plans


Files in This Item:

  1. 882218E009001.pdf