標題: 8吋矽晶圓半導體LPCVD製程設備之研發---子計畫I:LPCVD製程設備之加熱及進氣系統設計、流場模擬與系統整合及建立(III)
Heating and Gas Feeding System Design, Flow Simulation, Design and Establishment of a LPCVD Process Equipment (III)
作者: 林清發
LIN TSING-FA
交通大學機械工程系
關鍵字: 進氣系統;晶圓;熱傳導;催化劑;熱傳遞;反應器;Gas feeding system;Wafer;Thermal conductivity;Precursor;Heat transfer;Reactor
公開日期: 1999
官方說明文件#: NSC88-2218-E009-002
URI: http://hdl.handle.net/11536/94315
https://www.grb.gov.tw/search/planDetail?id=419317&docId=74448
Appears in Collections:Research Plans


Files in This Item:

  1. 882218E009002.pdf