標題: 12吋矽晶圓半導體CVD製程設備及BST介電薄膜成長研究---總計畫(III)
Research and Development of CVD Process Equipment for a 12-Inch Single Silicon Wafer and Growth of BST Dielectric Thin Film (III)
作者: 林清發
LIN TSING-FA
交通大學機械工程研究所
公開日期: 2002
官方說明文件#: NSC91-2212-E009-038
URI: http://hdl.handle.net/11536/93056
https://www.grb.gov.tw/search/planDetail?id=782996&docId=150396
Appears in Collections:Research Plans


Files in This Item:

  1. 912212E009038.pdf