標題: 高效率能源技術研究發展計畫-潔淨室省能技術與半導體製程省能技術
High-Efficiency Energy Technology Research and Development Project?Clean-Room and Semiconductor Manufacturing Energy-Saving Technology
作者: 陳俊勳
CHIUN-HSUNCHEN
國立交通大學{高效率能源技術研究中心}
關鍵字: 節約能源;半導體製程省能;低溫製程;Energy Conservation;Energy Saving Technology of Semiconductor Manufacture Processes;Low Temperature Processing
公開日期: 2004
摘要: ※關鍵詞:潔淨室流場設計;室溫選擇性液相沉積絕緣膜技術;低溫製程;快速加熱 本年度工作延續上一年度的成果,繼續進一步的研發,並對這五年的計畫作一總結。 計畫目標與工作內容為: (1)潔淨室整體設計;建立設計資料庫;技術擴散 (2)室溫液相沉積絕緣膜技術試產高品質絕緣膜;選擇性液相沉積法成長奈米尺寸閘極;技術擴散 (3)發展低溫濺鍍薄膜製程成長高品質鈦酸鍶鋇薄膜。 (4)12吋晶圓快速加熱薄膜成長均溫與省能技術開發。 其中第五年計畫著重產品之實驗室試產,技術之驗證,並與業界聯繫,使技術擴散。 經由上述工作內容,期能建立半導體產業及相關部門之共通性節約能源技術,以提升能源使用效率;培育能源相關人才以擴大能源科技團隊。
?HHH?HHXkeyword: Cleanroom design, Room-temperature selective liquid-phase deposition technology. Following the study last year, further research and development is proceeded. The aim of the project in this year is: 1.The design of FFU type cleanroom, establishment of design database, technology expansion 2.Development of room-temperature liquid-phase deposition technology and selective liquid-phase deposition technology (S-LPD), technology expansion 3.Development of Low temperature rf-sputtering process 4.Development of temperature uniformity and energy saving technology for 12-inch wafer are in rapid thermal processing (RTP). In summary, through this ?HHH?HH?H?HHigh-Efficiency Energy Technology Research and Development?HHH?HHH project, some specific and substantial energy saving technologies can be developed for the semi-conductor and related industrial. In addition, the training of energy-related personnel for energy saving can aid Taiwan with enormous capacity of competition in the world of twenty-first century.
官方說明文件#: 93-D0218
URI: http://hdl.handle.net/11536/91575
https://www.grb.gov.tw/search/planDetail?id=895100&docId=171167
Appears in Collections:Research Plans


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  1. RRPG93011076.pdf