標題: Subwavelength Antireflective Si Nanostructures Fabricated by Using the Self-Assembled Silver Metal-Nanomask
作者: Chang, Yuan-Ming
Shieh, Jiann
Juang, Jenh-Yih
電子物理學系
Department of Electrophysics
公開日期: 12-五月-2011
摘要: We report a lithography-free approach for fabricating silicon nanopillars (Si-NPs) and biomimetics porous silicon (P-Si) with excellent antireflective properties. The self-assembled silver nanostructures (nanoislands and disordered nanogrids) were formed via the Volmer-Weber (island growth) mode during the deposition process, which, in turn, serve as a metal-nanomask for the subsequent dry etching process carried out for fabricating the Si-NPs and P-Si on Si substrates. Reflectivity of about 0.65% was obtained over the spectral region ranging from deep-ultraviolet to infrared light (300-1000 nm). The remarkable antireflective characteristics obtained are attributed to the drastic decrease of effective index of refraction and the enhanced matching effect between air and substrate resulting from the Si nanostructures and suggesting an interesting alternative route for producing nanostructures that might be useful for photovoltaic applications.
URI: http://dx.doi.org/10.1021/jp201973y
http://hdl.handle.net/11536/8864
ISSN: 1932-7447
DOI: 10.1021/jp201973y
期刊: JOURNAL OF PHYSICAL CHEMISTRY C
Volume: 115
Issue: 18
起始頁: 8983
結束頁: 8987
顯示於類別:期刊論文


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