Title: Nanostructured thin films for anti-reflection applications
Authors: Chen, J. Y.
Sun, K. W.
Department of Applied Chemistry
Keywords: Nanoimprint;Anti-reflection;Sub-wavelength structure
Issue Date: 31-May-2011
Abstract: Anti-reflection (AR) thin films composed of ordered arrays of tapered nanostructures on the surface of PMMA and silicon, through the hot-embossing nanoimprint of polymer using molds prepared from e-beam lithography and hydrothermally grown ZnO nanorod arrays. The use of PMMA and ZnO nanorod thin films allows the formation of anti-reflection structures on a curved or flat surface to effectively suppress the reflectance of the incident light. It provides a simple and low-cost means for large-scale use in the production of AR layers for improving optical and optoelectronic device performance, such as solar cells and photodetectors. A drastic reduction in the reflectivity of the AR layer over a broad spectral range was demonstrated. In addition, the great improvement on the light harvest efficiency of the solar cells by over 30% using the nanostructured AR layer was validated. (C) 2011 Elsevier B.V. All rights reserved.
URI: http://dx.doi.org/10.1016/j.tsf.2011.01.110
ISSN: 0040-6090
DOI: 10.1016/j.tsf.2011.01.110
Volume: 519
Issue: 15
Begin Page: 5194
End Page: 5198
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