標題: Microplasma device utilizing SU-8 photoresist as a barrier rib
作者: Kim, Sung-O
光電工程學系
顯示科技研究所
Department of Photonics
Institute of Display
關鍵字: microdischarge
公開日期: 1-八月-2008
摘要: A Microplasma device utilizing SU-8 photoresist as a barrier rib has been fabricated and characterized operating in the abnormal mode for neon pressures from 300 to 800 torr and having a hexagonal structure, 5 x 5 arrays of microplasma. The microplasma device, which has a simple fabrication process, offers advantages such as low firing voltage, low cost, and stable glow discharge. The electrical properties have been examined by bipolar voltage waveforms with different frequencies. The geometric patterns of the barrier rib can be simply changed by lithographic techniques.
URI: http://dx.doi.org/10.1109/TPS.2008.922939
http://hdl.handle.net/11536/8509
ISSN: 0093-3813
DOI: 10.1109/TPS.2008.922939
期刊: IEEE TRANSACTIONS ON PLASMA SCIENCE
Volume: 36
Issue: 4
起始頁: 1244
結束頁: 1245
顯示於類別:期刊論文


文件中的檔案:

  1. 000258618200192.pdf