A Master Scheduling for the TFT-Array Production with reticle resource constraint
In the photolithography process of TFT-Array, the exposure process will be tackled only when the specific reticle is ready on the machine and the exchanges of reticles also take time to setup. Owning to the characters mentioning above, it is quite difficult to schedule. TFT-Array, the fisrt stage of the process of TFT-LCD, is the circumstance making to order. If the factory can not reach the planned amount of throughputs, it will contribute to a mess after the stage and the order will be postponed. Since the resources of reticles are less considered in the recent essays concerning MPS of TFT-Array, the work brings up a MPS of TFT-Array by MIP model considering the constraint of reticles and solving by minimizing the quantity of delay of each product . For one thing, the study roughly estimate the capacity to see whether we can satisfy the amount of throughputs that is scheduled among the planning horizon or not. For the purpose of minimizing the postponed number of products’ layers, this paper also solves the problem that take the constrain of quantity of reticles and the character of reentry into account by LP model. If the amount of delay is at zero in the planning horizon, we shift the object to maximize the throughputs for avoiding the waste of capacity. Furthermore, this work think about that the manager is prone to modify MPS and design a decision process employing reticles and capacity efficiently and count the information of cost of shortage supply as well as times of setup. In doing so, the process can provide the supervisor with the information to confirm whether it is necessary to adjust previous scheduling or not. The experimental results reveals that the reticle and machine match not only minimize the quantity of delay of each product, but also utilize the capacity of reticle and machine adequately; the study certainty have correct effect of minimize the quantity of delay of each product through compare with Ru-Min Yan. Consequently, the mechanism propose in this research is effective and efficient, and can be used to plan MPS for the TFT-Array Production with reticle resource constraint.
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