標題: Influences of silicon nano-crystallized structures on the optical performance of silicon oxynitride rib-type waveguides
作者: Liu, Wen-Jen
Lai, Yin-Chieh
Weng, Min-Hang
光電工程學系
Department of Photonics
關鍵字: Waveguide;Silicon oxynitride;PECVD;Optical properties;Optical communication
公開日期: 1-Dec-2008
摘要: Silicon oxynitride (SiON) films were deposited on p-type (100) silicon substrates by plasma enhanced chemical vapor deposition (PECVD), at the temperature of 300 degrees C, using silane (SiH(4)), nitrogen (N(2)) ammonia (NH(3)) and laughing gas (N(2)O) as gas precursors. The effects of the processing gas ratio of N(2)O/(N(2)+NH(3)) on the optical properties, microstructure and chemical bonding evolutions of SiON material, and the influences of silicon nano-crystallized structures on the optical performance of SiON-based rib-type optical waveguides were studied. Microstructure evolutions analysis and optical measurements indicated that the refractive index and the extinction coefficient could be precisely determined by controlling the N(2)O/(N(2)+NH(3)) ratio and the thermal annealing process. A greater density and dimension of silicon nanocrystallized structures resulted in more optical scattering effect phenomena occurring between the interface of silicon nano-crystallized structure and SiON matrix and more optical propagation loss. (C) 2008 Elsevier B.V. All rights reserved.
URI: http://dx.doi.org/10.1016/j.tsf.2008.06.021
http://hdl.handle.net/11536/8117
ISSN: 0040-6090
DOI: 10.1016/j.tsf.2008.06.021
期刊: THIN SOLID FILMS
Volume: 517
Issue: 3
起始頁: 1086
結束頁: 1090
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