Pentacene patterning by the adjustment of surface energy and its application in OTFTs
In this thesis, the pentacene patterning by adjusting the surface energy was discussed. Firstly the surface energy was controlled by the self-assembled layer (SAM) treatment and the partial ultra-violet (UV) light exposure through quartz-glass mask. Then, after pentacene deposition, water dipping was used to remove the pentacene on UV-exposed area. The adhesion energy and the intrusion energy were analyzed to reveal that the dipping was a lift-off process and the key for successful patterning was the intrusion energy between pentacene, substrate (hydrophilic or hydrophobic) and the D.I. water. The proposed technology was compatible to conventional lithography system and is applicable to OTFT arrays. Next, the remaining pentacene film was fabricated as a top-contact OTFTs to confirm the practicability of this technology. According to the output characteristics of OTFTs , the performance kept favorable and superior to that of the control sample. The mobility, the on/off current ratio (higher than 106) and the sub-threshold swing were also improved.
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