標題: The Annihilation of Threading Dislocations in the Germanium Epitaxially Grown within the Silicon Nanoscale Trenches
作者: Luo, Guang-Li
Huang, Shih-Chiang
Ko, Chih-Hsin
Wann, Clement H.
Chung, Cheng-Ting
Han, Zong-You
Cheng, Chao-Ching
Chang, Chun-Yen
Lin, Hau-Yu
Chien, Chao-Hsin
電子工程學系及電子研究所
Department of Electronics Engineering and Institute of Electronics
關鍵字: annealing;dislocation density;elemental semiconductors;germanium;isolation technology;nanotechnology;semiconductor epitaxial layers;semiconductor growth;transmission electron microscopy
公開日期: 2009
摘要: We investigated the selective growth of germanium into nanoscale trenches on silicon substrates. These nanoscale trenches, the smallest size of which was 50 nm, were fabricated using the state-of-the-art shallow trench isolation technique. The quality of the Ge films was evaluated using transmission electron microscopy. The formation of threading dislocations (TDs) was effectively suppressed when using this deposition technique. For the Ge grown in nanoscale Si areas (e.g., several tens of nanometers), the TDs were probably readily removed during cyclic thermal annealing predominantly because their gliding distance to the SiO(2) sidewalls was very short. Therefore, nanoscale epitaxial growth technology can be used to deposit Ge films on lattice-mismatched Si substrates with a reduced defect density.
URI: http://hdl.handle.net/11536/7885
http://dx.doi.org/10.1149/1.3158832
ISSN: 0013-4651
DOI: 10.1149/1.3158832
期刊: JOURNAL OF THE ELECTROCHEMICAL SOCIETY
Volume: 156
Issue: 9
起始頁: H703
結束頁: H706
Appears in Collections:Articles


Files in This Item:

  1. 000268405400051.pdf