Title: Fabrication and characterization of three-dimensional all metallic photonic crystals for near infrared applications
Authors: Yang, Yu-Lin
Hou, Fu-Ju
Wu, Shich-Chuan
Huang, Wen-Hsien
Lai, Ming-Chih
Huang, Yang-Tung
Department of Electronics Engineering and Institute of Electronics
Keywords: copper;electron beam lithography;hydrogen compounds;interconnections;light polarisation;optical interconnections;photonic band gap;photonic crystals
Issue Date: 26-Jan-2009
Abstract: Three-dimensional all metallic photonic crystals with a feature size of 0.20 mu m were fabricated using electron-beam lithography with the photoresist of hydrogen silesquioxane. This process method has high compatibility with the fabrication of damascene copper interconnections and also simplifies the whole process flow. The dependence of the complete photonic band gaps on polarization was experimentally observed and compared with the simulation results. The band edge for the four-layer lattice was found at a wavelength of around 0.80 mu m in normal incidence.
URI: http://dx.doi.org/10.1063/1.3075056
ISSN: 0003-6951
DOI: 10.1063/1.3075056
Volume: 94
Issue: 4
End Page: 
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