A Facile Route to Fabrication of Large Area Silicon Nanowire Arrays vis Spontaneous Electrochemical Reactions
|關鍵字:||矽奈米線陳列;無電金屬沈積;自發電化學反應;silicon nanowire arrays;electroless metal deposition;spontaneous electrochemical reactions|
Owing to the semi-conductor properties and the great potential for developing various applied devices, there has been growing concern in academics about silicon nanowires (SiNWs) recently. In this thesis, a simple method via electroless metal deposition (EMD) has been reported. This method can circumvent the shortcomings of SiNWs synthesis based on the vapor-liquid-solid (VLS) mechanism. By employing the spontaneous electrochmical reactions with silver nitrate / hydrofluoric acid solution, large areas of single crystal SiNW arrays were produced on silicon wafer in aqueous solution under room temperature, standard pressure, and atmosphere conditions. In order to decrease the SiNWs’ diameter and improve the uniformity, silicon wafers coated with gold nanoparticles (AuNPs), which were prepared by sputtering and annealing, were used as the starting material. When the electrochemical reaction started on AuNPs, the products with smaller, tidier, and more consensus wire diameters were obtained. Replacing silver nitrate with cooper nitrate or potassium hexachloroplatinate in the reaction solution, copper or platinum nanoparticles were coated on SiNW arrays, which further increase the applicability of the products.
|Appears in Collections:||Thesis|
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