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dc.contributor.author陳昱安en_US
dc.contributor.authorChen, Yu-Anen_US
dc.contributor.author趙家佐en_US
dc.contributor.authorChao, Chia-Tsoen_US
dc.date.accessioned2014-12-12T02:37:29Z-
dc.date.available2014-12-12T02:37:29Z-
dc.date.issued2013en_US
dc.identifier.urihttp://140.113.39.130/cdrfb3/record/nctu/#GT070050259en_US
dc.identifier.urihttp://hdl.handle.net/11536/73273-
dc.description.abstract這篇論文提出將針對以完成繞線的電路,以盡量在不影響原本電路設計的情況下,對繞線進行簡單操作,以提高聚焦離子束完成電路修補的比例,並確保最後最大延遲時間不會增加。 首先探討聚焦離子束在電路中的所受到的限制,定義出各個在調整成能執行聚焦離子束的電路修補時所造成的代價,根據這個代價去設計架構- ReFL(Repair Friendly Layout Generation for FIB Technology),以提升電路修補的效能,最後去比較不同作法所提升的比例,並且分析結果,討論未來可做的方式。zh_TW
dc.description.abstractThis thesis proposes a methodology for the layout, which is completed routing and placement. There are some simple operations of adjustment for the metals without effecting the circuit seriously. These operations could make the rate of FIB repair rise, and keep the critical path delay. First, there are introduction of limitation of FIB. Then, we define the cost which spend for adjustment of FIB repairable cell. According the cost, we design a framework for rising the rate of FIB repairable cell called "ReFL"(Repair Friendly Layout Generation for FIB Technology). Finally, it compares other methods and ours by experimental result, and discuss the future work.en_US
dc.language.isozh_TWen_US
dc.subject聚焦離子束技術zh_TW
dc.subject設計自動化zh_TW
dc.subjectFIBen_US
dc.subjectEDAen_US
dc.subjectFocus Ion Beamen_US
dc.title微調電路佈局以適合聚焦離子束技術zh_TW
dc.titleRepair Friendly Layout Generation for FIB Technologyen_US
dc.typeThesisen_US
dc.contributor.department電子工程學系 電子研究所zh_TW
Appears in Collections:Thesis


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