標題: Fabrication of Antireflective Sub-Wavelength Structures on Silicon Nitride Using Nano Cluster Mask for Solar Cell Application
作者: Sahoo, Kartika Chandra
Lin, Men-Ku
Chang, Edward-Yi
Lu, Yi-Yao
Chen, Chun-Chi
Huang, Jin-Hua
Chang, Chun-Wei
材料科學與工程學系
Department of Materials Science and Engineering
關鍵字: Sub-wavelength Structure;Solar cell;SWS fabrication;Reflectance;Anti-reflective coatings
公開日期: 1-Jul-2009
摘要: We have developed a simple and scalable approach for fabricating sub-wavelength structures (SWS) on silicon nitride by means of self-assembled nickel nanoparticle masks and inductively coupled plasma (ICP) ion etching. Silicon nitride SWS surfaces with diameter of 160-200 nm and a height of 140-150 nm were obtained. A low reflectivity below 1% was observed over wavelength from 590 to 680 nm. Using the measured reflectivity data in PC1D, the solar cell characteristics has been compared for single layer anti-reflection (SLAR) coatings and SWS and a 0.8% improvement in efficiency has been seen.
URI: http://dx.doi.org/10.1007/s11671-009-9297-7
http://hdl.handle.net/11536/7020
ISSN: 1931-7573
DOI: 10.1007/s11671-009-9297-7
期刊: NANOSCALE RESEARCH LETTERS
Volume: 4
Issue: 7
起始頁: 680
結束頁: 683
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