標題: Characterization of patterned poly(methyl methacrylate) brushes under various structures upon solvent immersion
作者: Chen, Jem-Kun
Hsieh, Chih-Yi
Huang, Chih-Feng
Li, Po-min
應用化學系
Department of Applied Chemistry
關鍵字: ATRP;Grafting density;Surface coverage;Very-large-scale integration;PMMA brush
公開日期: 15-十月-2009
摘要: In this paper we describe a graft polymerization/solvent immersion method for generating various patterns of polymer brushes. We used a very-large-scale integration (VLSI) process and oxygen plasma system to generate well-defined patterns of polymerized methyl methacrylate (MMA) on patterned Si(1 0 0) surfaces through atom transfer radical polymerization (ATRP). After immersion of wafers presenting lines of these PMMA brushes in water and tetrahydrofuran, we observed mushroom-and brush-like regimes through grafting densities and surface coverages, respectively, for the PMMA brushes with various pattern resolutions. In the mushroom-like regime, the distance between lines of PMMA brushes was smaller than that of the lines patterned lithographically on the wafer; in the brush-like regime, this distance was approximately the same. This new strategy allows polymer brushes to be prepared through graft polymerization and then have their patterns varied through solvent immersion. (C) 2009 Elsevier Inc. All rights reserved.
URI: http://dx.doi.org/10.1016/j.jcis.2009.06.040
http://hdl.handle.net/11536/6562
ISSN: 0021-9797
DOI: 10.1016/j.jcis.2009.06.040
期刊: JOURNAL OF COLLOID AND INTERFACE SCIENCE
Volume: 338
Issue: 2
起始頁: 428
結束頁: 434
顯示於類別:期刊論文


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  1. 000272262700013.pdf