標題: Pore sealing of mesoporous silica low-k dielectrics by oxygen and argon plasma treatments
作者: Chang, Chih-Chieh
Pan, Fu-Ming
Chen, Ching-Wen
材料科學與工程學系
Department of Materials Science and Engineering
關鍵字: Plasma treatment;Pore sealing;Low-k dielectric
公開日期: 1-十一月-2009
摘要: In this study, we have prepared surfactant templated mesoporous silica thin films as the ultralow-k dielectrics and a TaN(x) thin film deposited by plasma enhanced atomic layer chemical vapor deposition (PE-ALCVD) using TaCl(5) as the gas precursor was used as the diffusion barrier. Without any surface modification for the dielectric layer, Ta atoms could easily diffuse into the mesoporous layer seriously degrading dielectric properties. O(2) and Ar plasmas have been used to modify the surface of the mesoporous dielectric in a high density plasma chemical vapor deposition (HDP-CVD) system, and both of the treatments produced a densified oxide layer a few nanometer thick. According to transmission electron microscopy and Auger electron spectroscopy, the pore sealing treatment could effectively prevent Ta atoms from diffusing into the mesoporous dielectric during the PE-ALCVD process. (C) 2009 Elsevier B.V. All rights reserved.
URI: http://dx.doi.org/10.1016/j.mee.2009.03.127
http://hdl.handle.net/11536/6452
ISSN: 0167-9317
DOI: 10.1016/j.mee.2009.03.127
期刊: MICROELECTRONIC ENGINEERING
Volume: 86
Issue: 11
起始頁: 2241
結束頁: 2246
顯示於類別:期刊論文


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  1. 000271363900019.pdf