The Characterization of Pure Metal Targets AID Deposited TiZrN Thin Film
Dr. Char-Fu Chen
|關鍵字:||陰極電弧沉積法;硬質薄膜;Cathodic arc deposition;hard coatings;TiZrN|
In this study it tried to deposit TiZrN thin films on SKD11 steels and 304 stainless steels in the way of arc ion plating by pure Ti and Zr metals and studied in the effects of various process parameters for coatings. In analysis, the structures, compositions of the coatings were studied by means of XRD,GDS,SEM and EDS. Vickers micro-hardness indentation and Rockswell hardness indentation were used to measure the hardness and adhesion of coatings. The roughness of coatings surface was determined by α-stepper. In SEM analysis we knew that there are obviously column structure in coatings in low N2 pressure, high arc currents and high substrate bias voltages. In GDS and EDS analysis, we knew that the components of coatings were so uniform. The solution of XRD analysis showed that there are three different phases, TiZrN, TiN and ZrN, in the coatings. All of them were (111) orientated, and the angles of TiZrN(111) diffraction peaks were between 34.211O and 35.449O . In various process parameters, the values of coatings surface roughness are between 254nm and 530nm. With increasing of targets current from single Ti target 40A to double Ti targets 90A, the rate of Ti/Zr increased from 0.25/0.75 to 0.7/0.3. In listed parameters: N2 Pressure was 2Pa, the Zr target current was 90A, both Ti targets current were 40A and the potential of substrate was -200V, the value of Ti/Zr was 0.45/0.55, and there was the highest value in hardness,3452Hv0.05.
|Appears in Collections:||Thesis|