Title: 雙本質層非晶矽薄膜電晶體之研究
Study on the dual-intrinsic-layer hydrogenated amorphous silicon thin film transistors
Authors: 蔡俊偉
鄭晃忠
電子研究所
Issue Date: 1997
URI: http://140.113.39.130/cdrfb3/record/nctu/#NT866430100
http://hdl.handle.net/11536/63678
Appears in Collections:Thesis