|標題:||High-Performance InGaZnO Thin-Film Transistors Using HfLaO Gate Dielectric|
|作者:||Su, N. C.|
Wang, S. J.
Department of Electronics Engineering and Institute of Electronics
|關鍵字:||Amorphous indium-gallium-zinc oxide (a-IGZO);equivalent oxide thickness;HfLaO;high-k;thin-film transistors|
|摘要:||In this letter, we report a low-voltage-driven amorphous indium-gallium-zinc oxide thin-film transistor with a high-k-value HfLaO gate dielectric. Good characteristics were achieved including a low V(T) of 0.22 V, small subthreshold swing of 76 mV/dec, high mobility of 25 cm(2)/V . s, and large I(on)/I(off) ratio of 5 x 10(7). These good performances are obtained at an operation voltage as low as 2 V. These characteristics are attractive for high-switching-speed and low-power applications.|
|期刊:||IEEE ELECTRON DEVICE LETTERS|