標題: 金屬層間介電層和複晶矽介電層之研究及其對深次微米元件之影響
= Study of intermetal and interpoly-silicon dielectrics processes and their impacts on deep-submicron MOSFETs
作者: 林友民
雷添福
電子研究所
公開日期: 1996
URI: http://140.113.39.130/cdrfb3/record/nctu/#NT856430122
http://hdl.handle.net/11536/62559
Appears in Collections:Thesis