Studies of Zn1-xMnxSe Thin Films Prepared by R.F. Sputtering
The Zn1-xMnxSe thin films with various Mn concentration were fabricated by using the R.F. sputtering technique. We controlled the deposition conditions, for example, the substrate temperature, the period of in-situ post annealing and the different kind of substrate during the deposition process. We have obtained the optimum conditions to grow the Zn1-xMnxSe films. By the X-ray diffraction measurement, the structure and crystallization of the thin film. By using the scanning electron microscope, We have found the grain size decreased as the Mn concentration was increased. We have also found the grain size of as-deposited thin films could be varied by increasing the annealing time. The Raman spectra was used to study the lattice vibration and optical phonon property of Zni-xMnxSe thin film.
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