標題: Growth of epitaxial zirconium-doped indium oxide (222) at low temperature by rf sputtering
作者: Liang, Yuan-Chang
Lee, Hsin-Yi
材料科學與工程學系
Department of Materials Science and Engineering
公開日期: 2010
摘要: Zr-doped In(2)O(3) (Zr-In(2)O(3)) (222) epitaxial layers of thickness 210 nm were grown on yttria-stabilized zirconia (YSZ) (111) and Al(2)O(3) (0001) substrates with rf magnetron sputtering at 350 degrees C in an atmosphere deficient in oxygen. X-Ray scattering and use of a transmission electron microscope (TEM) revealed Zr-In(2)O(3) films to be deposited epitaxially on YSZ (111) and Al(2)O(3) (0001). Images observed with an atomic-force microscope demonstrate that the substrate profoundly affected the topography of the Zr-In(2)O(3) (222) epilayers. The large mismatch of the Zr-Al(2)O(3) (222)/Al(2)O(3) (0001) heteroepitaxy was responsible for the surface structure of the epilayer being rougher than that on YSZ (111). Cross-sectional TEM images reveal dense crystalline films with no macroscopic imperfection; the crystalline order of Zr-In(2)O(3) epilayers is preserved up to the top surface. The Zr-In(2)O(3) (222)/YSZ (111) heteroepitaxy has a Hall mobility greater than that of Zr-In(2)O(3) (222)/Al(2)O(3) (0001), perhaps due to the greater lattice mismatch of the Zr-In(2)O(3) (222)/Al(2)O(3) (0001) heteroepitaxy that results in Zr-In(2)O(3) having a poor crystalline quality. Domain boundaries on a nanometre scale were found in the heteroepitaxial Zr-In(2)O(3) (222)/Al(2)O(3) (0001) resulting from random nucleation and relaxation of misfit stress. The existence of these domain boundaries on a nanometre scale thus affects the electrical properties of the Zr-In(2)O(3) epilayer.
URI: http://hdl.handle.net/11536/6220
http://dx.doi.org/10.1039/c004452k
ISSN: 1466-8033
DOI: 10.1039/c004452k
期刊: CRYSTENGCOMM
Volume: 12
Issue: 10
起始頁: 3172
結束頁: 3176
顯示於類別:期刊論文


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