Title: Thin-Film Composite Materials as a Dielectric Layer for Flexible Metal-Insulator-Metal Capacitors
Authors: Tiwari, Jitendra N.
Meena, Jagan Singh
Wu, Chung-Shu
Tiwari, Rajanish N.
Chu, Min-Ching
Chang, Feng-Chih
Ko, Fu-Hsiang
Department of Materials Science and Engineering
Keywords: block copolymers;green chemistry;nanotechnology;sol gel processes;thin films
Issue Date: 2010
Abstract: A new organic-organic nanoscale composite thin-film (NCTF) dielectric has been synthesized by solution deposition of 1-bromoadamantane and triblock copolymer (Pluronic P123, BASF, EO(20)-PO(70)-EO(20)), in which the precursor solution has been achieved with organic additives. We have used a sol-gel process to make a metal-insulator-metal capacitor (MIM) comprising a nanoscale (10 nm-thick) thin-film on a flexible polyimide (PI) substrate at room temperature. Scanning electron microscope and atomic force microscope revealed that the deposited NCTFs were crack-free, uniform, highly resistant to moisture absorption, and well adhered on the Au-Cr/PI. The electrical properties of 1-bromoadamantane-P123 NCTF were characterized by dielectric constant, capacitance, and leakage current measurements. The 1-bromoadamantane-P123 NCTF on the PI substrate showed a low leakage current density of 5.5 x 10(-11) A cm(-2) and good capacitance of 2.4 fF at 1 MHz. In addition, the calculated dielectric constant of 1-bromoadamantane-P123 NCTF was 1.9, making them suitable candidates for use in future flexible electronic devices as a stable intermetal dielectric. The electrical insulating properties of 1-bromoadamantane-P123 NCTF have been improved due to the optimized dipole moments of the van der Waals interactions.
URI: http://hdl.handle.net/11536/6118
ISSN: 1864-5631
DOI: 10.1002/cssc.201000118
Volume: 3
Issue: 9
Begin Page: 1051
End Page: 1056
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