標題: 利用電子束微影系統製作分佈回饋半導體雷射的二階光柵
2nd order DFB laser grating fabrication by E-beam lithography
作者: 涂結盛
Tu, Jie-Sheng
辛偉
高曜煌
Xin, Wei
Gao-Yue, Huang
電信工程研究所
關鍵字: 二階光柵;電子束微影;半導體雷射關鍵字: 電信;電子工程;電信;"DFB;GRATING;E-BEAM LITHOGRAPHYALEICA EBL-3;TELECOMMUNICATION;ELECTRONIC-ENGINEERING;Grating;E-Beam Lithography;Leica EBL-300;DFB,Grating,E-Beam Lithography,Leica EBL-300,"
公開日期: 1994
摘要: 我們利用了電子束微影系統來製作我們要的二階光柵.在這製作過程中,我 們利用了兩種阻液, 一個為正光阻ZEP520, 一個為負光阻 SAL601 ER-7在 這製作過程中, 會因為我們所選的阻液之感光度的不同以及電子本身的一 些特性和碎片晶片對焦的問題, 導至我們最初實驗的結果不甚理想 ,我們 將提出一些改進的方法 .最後我們將把成功的二階光柵的各個參數及電子 顯微鏡所拍的二階光柵的圖型列出來, 以做為將來製作一階光柵及圓形光 柵的一個參考的依據 . We fabricate 2nd order grating of DFB laser by E-beam lithograp- hy . We choose two kinds of resist , one is positive resist ZEP- 520 , another is negative resist SAl 601 ER-7 . In our fabricay- ion process will be strongly affected by electron scattering and focusing of the e-beam . We will offer some improvement methods. Finally,we show our successful grating SEM picture and thier pa- rameters . It will be served as a guide line for developing the 1st order grating or circular grating in the future .
URI: http://140.113.39.130/cdrfb3/record/nctu/#NT834435001
http://hdl.handle.net/11536/59917
Appears in Collections:Thesis