標題: Relation between the plasma characteristics and physical properties of functional zinc oxide thin film prepared by radio frequency magnetron sputtering process
作者: Hsu, Che-Wei
Cheng, Tsung-Chieh
Huang, Wen-Hsien
Wu, Jong-Shinn
Cheng, Cheng-Chih
Cheng, Kai-Wen
Huang, Shih-Chiang
機械工程學系
Department of Mechanical Engineering
關鍵字: Zinc Oxide;Ion bombardment;Optical properties;Radio-frequency sputtering;UV protection coatings
公開日期: 1-二月-2010
摘要: The ZnO thin film was deposited on a glass substrate by a RF reactive magnetron sputtering method. Results showed that plasma density, electron temperature, deposition rate and estimated ion bombardment energy increase with increasing applied RF power. Three distinct power regimes were observed, which are strongly cot-related with plasma properties. In the low-power regime, the largest grain size was observed due to slow deposition rate. In the medium-power regime, the smallest grain size was found, which is attributed to insufficient time for the adatoms to migrate on substrate surface. In the high-power regime, relatively larger grain size was found due to very large ion bombardment energy which enhances the thermal migration of adatoms. Regardless of pure ZnO thin film or ZnO on glass, high transmittance (>80%) in the visible region can be generally observed. However, the film thickness plays a more important role for controlling optical properties, especially in the UV region, than the applied RF power. In general, with properly coated ZnO thin film, we can obtain a glass substrate which is highly transparent in the visible region, is of good anti-UV characteristics, and is highly hydrophobic, which is highly suitable for applications in the glass industry. (C) 2009 Elsevier B.V. All rights reserved.
URI: http://dx.doi.org/10.1016/j.tsf.2009.07.181
http://hdl.handle.net/11536/5874
ISSN: 0040-6090
DOI: 10.1016/j.tsf.2009.07.181
期刊: THIN SOLID FILMS
Volume: 518
Issue: 8
起始頁: 1953
結束頁: 1957
顯示於類別:期刊論文


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