Title: Relation between the plasma characteristics and physical properties of functional zinc oxide thin film prepared by radio frequency magnetron sputtering process
Authors: Hsu, Che-Wei
Cheng, Tsung-Chieh
Huang, Wen-Hsien
Wu, Jong-Shinn
Cheng, Cheng-Chih
Cheng, Kai-Wen
Huang, Shih-Chiang
Department of Mechanical Engineering
Keywords: Zinc Oxide;Ion bombardment;Optical properties;Radio-frequency sputtering;UV protection coatings
Issue Date: 1-Feb-2010
Abstract: The ZnO thin film was deposited on a glass substrate by a RF reactive magnetron sputtering method. Results showed that plasma density, electron temperature, deposition rate and estimated ion bombardment energy increase with increasing applied RF power. Three distinct power regimes were observed, which are strongly cot-related with plasma properties. In the low-power regime, the largest grain size was observed due to slow deposition rate. In the medium-power regime, the smallest grain size was found, which is attributed to insufficient time for the adatoms to migrate on substrate surface. In the high-power regime, relatively larger grain size was found due to very large ion bombardment energy which enhances the thermal migration of adatoms. Regardless of pure ZnO thin film or ZnO on glass, high transmittance (>80%) in the visible region can be generally observed. However, the film thickness plays a more important role for controlling optical properties, especially in the UV region, than the applied RF power. In general, with properly coated ZnO thin film, we can obtain a glass substrate which is highly transparent in the visible region, is of good anti-UV characteristics, and is highly hydrophobic, which is highly suitable for applications in the glass industry. (C) 2009 Elsevier B.V. All rights reserved.
URI: http://dx.doi.org/10.1016/j.tsf.2009.07.181
ISSN: 0040-6090
DOI: 10.1016/j.tsf.2009.07.181
Volume: 518
Issue: 8
Begin Page: 1953
End Page: 1957
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