標題: The synthesis of diamond films on adamantane-coated Si substrate at low temperature
作者: Tiwari, Rajanish N.
Tiwari, Jitendra N.
Chang, Li
材料科學與工程學系
Department of Materials Science and Engineering
關鍵字: Diamond;Adamantane;MPCVD
公開日期: 15-四月-2010
摘要: Diamond films have been synthesized on the adamantane-coated Si (1 00) substrate by microwave plasma chemical vapor deposition from a gaseous mixture of methane and hydrogen gases with a growth rate of similar to 6.7 nm/min. The substrate temperature was similar to 475 degrees C during diamond deposition. The films obtained have good crystallinity that is characterized by scanning electron microscopy and Raman spectrometry. X-ray photoelectron spectroscopy analysis has confirmed that diamond nucleation and growth are on SiC rather than clean Si. The possible mechanism of high rate growth diamond films has been demonstrated. (C) 2010 Elsevier B.V. All rights reserved.
URI: http://dx.doi.org/10.1016/j.cej.2010.01.024
http://hdl.handle.net/11536/5510
ISSN: 1385-8947
DOI: 10.1016/j.cej.2010.01.024
期刊: CHEMICAL ENGINEERING JOURNAL
Volume: 158
Issue: 3
起始頁: 641
結束頁: 645
顯示於類別:期刊論文


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