標題: Growth, microstructure, and field-emission properties of synthesized diamond film on adamantane-coated silicon substrate by microwave plasma chemical vapor deposition
作者: Tiwari, Rajanish N.
Chang, Li
材料科學與工程學系
Department of Materials Science and Engineering
公開日期: 15-五月-2010
摘要: Diamond nucleation on unscratched Si surface is great importance for its growth, and detailed understanding of this process is therefore desired for many applications. The pretreatment of the substrate surface may influence the initial growth period. In this study, diamond films have been synthesized on adamantane-coated crystalline silicon {100} substrate by microwave plasma chemical vapor deposition from a gaseous mixture of methane and hydrogen gases without the application of a bias voltage to the substrates. Prior to adamantane coating, the Si substrates were not pretreated such as abraded/scratched. The substrate temperature was similar to 530 degrees C during diamond deposition. The deposited films are characterized by scanning electron microscopy, Raman spectrometry, x-ray diffraction, and x-ray photoelectron spectroscopy. These measurements provide definitive evidence for high-crystalline quality diamond film, which is synthesized on a SiC rather than clean Si substrate. Characterization through atomic force microscope allows establishing fine quality criteria of the film according to the grain size of nanodiamond along with SiC. The diamond films exhibit a low-threshold (55 V/mu m) and high current-density (1.6 mA/cm(2)) field-emission (FE) display. The possible mechanism of formation of diamond films and their FE properties have been demonstrated. (C) 2010 American Institute of Physics. [doi:10.1063/1.3427436]
URI: http://dx.doi.org/10.1063/1.3427436
http://hdl.handle.net/11536/5404
ISSN: 0021-8979
DOI: 10.1063/1.3427436
期刊: JOURNAL OF APPLIED PHYSICS
Volume: 107
Issue: 10
結束頁: 
顯示於類別:期刊論文


文件中的檔案:

  1. 000278182400016.pdf