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dc.contributor.authorMartin, L. W.en_US
dc.contributor.authorChu, Y-H.en_US
dc.contributor.authorRamesh, R.en_US
dc.date.accessioned2014-12-08T15:06:53Z-
dc.date.available2014-12-08T15:06:53Z-
dc.date.issued2010-05-20en_US
dc.identifier.issn0927-796Xen_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.mser.2010.03.001en_US
dc.identifier.urihttp://hdl.handle.net/11536/5393-
dc.description.abstractThe growth and characterization of functional oxide thin films that are ferroelectric, magnetic, or both at the same time are reviewed. The evolution of synthesis techniques and how advances in in situ characterization have enabled significant acceleration in improvements to these materials are described. Methods for enhancing the properties of functional materials or creating entirely new functionality at interfaces are covered, including strain engineering and layering control at the atomic-layer level. Emerging applications of these functional oxides such as achieving electrical control of ferromagnetism and the future of these complex functional oxides is discussed. (C) 2010 Elsevier B.V. All rights reserved.en_US
dc.language.isoen_USen_US
dc.subjectThin filmsen_US
dc.subjectMultiferroicen_US
dc.subjectMagneticen_US
dc.subjectferroelectricen_US
dc.subjectComplex oxidesen_US
dc.titleAdvances in the growth and characterization of magnetic, ferroelectric, and multiferroic oxide thin filmsen_US
dc.typeReviewen_US
dc.identifier.doi10.1016/j.mser.2010.03.001en_US
dc.identifier.journalMATERIALS SCIENCE & ENGINEERING R-REPORTSen_US
dc.citation.volume68en_US
dc.citation.issue4-6en_US
dc.citation.spageIIIen_US
dc.citation.epage133en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000278988200001-
dc.citation.woscount185-
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