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Issue DateTitleAuthor(s)
1-Aug-2000Forward gated-diode measurement of filled traps in high-field stressed thin oxidesChen, MJ; Kang, TK; Huang, HT; Liu, CH; Chang, YJ; Fu, KY; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-Mar-2000A new observation of band-to-band tunneling induced hot-carrier stress using charge-pumping techniqueChu, YL; Wu, CY; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-May-2004Schottky-barrier S/D MOSFETs with high-K gate dielectrics and metal-gate electrodeZhu, SY; Yu, HY; Whang, SJ; Chen, JH; Shen, C; Zhu, CX; Lee, SJ; Li, MF; Chan, DSH; Yoo, WJ; Du, AY; Tung, CH; Singh, J; Chin, A; Kwong, DL; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-Sep-2004A TaN-HfO2-Ge pMOSFET with novel SiH4 surface passivationWu, N; Zhang, QC; Zhu, CX; Chan, DSH; Du, AY; Balasubramanian, N; Li, MF; Chin, A; Sin, JKO; Kwong, DL; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
2009Enhancement of Stress-Memorization Technique on nMOSFETs by Multiple Strain-Gate EngineeringLu, Tsung Yi; Wang, Chin Meng; Chao, Tien-Sheng; 電子物理學系; Department of Electrophysics
1-Aug-2009Enhanced Hole Gate Direct Tunneling Current in Process-Induced Uniaxial Compressive Stress p-MOSFETsHsu, Chih-Yu; Lee, Chien-Chih; Lin, Yi-Tang; Hsieh, Chen-Yu; Chen, Ming-Jer; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-Jul-2009A Comparative Study of Carrier Transport for Overlapped and Nonoverlapped Multiple-Gate SOI MOSFETsLee, Wei; Su, Pin; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-May-2009Distinguishing Between STI Stress and Delta Width in Gate Direct Tunneling Current of Narrow n-MOSFETsHsieh, Chen-Yu; Lin, Yi-Tang; Chen, Ming-Jer; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-Sep-2008Investigation of Coulomb Mobility in Nanoscale Strained PMOSFETsChen, William Po-Nien; Su, Pin; Goto, Ken-Ichi; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-Sep-2008A millisecond-anneal-assisted selective fully silicided (FUSI) gate processLin, Da-Wen; Wang, Maureen; Cheng, Ming-Lung; Sheu, Yi-Ming; Tarng, Bennet; Chu, Che-Min; Nieh, Chun-Wen; Lo, Chia-Ping; Tsai, Wen-Chi; Lin, Rachel; Wang, Shyh-Wei; Cheng, Kuan-Lun; Wu, Chii-Ming; Lei, Ming-Ta; Wu, Chung-Cheng; Diaz, Carlos H.; Chen, Ming-Jer; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics