標題: STUDY OF ELECTRICAL CHARACTERISTICS ON THERMALLY NITRIDED SIO2 (NITROXIDE) FILMS
作者: CHEN, CT
TSENG, FC
CHANG, CY
LEE, MK
電控工程研究所
Institute of Electrical and Control Engineering
公開日期: 1984
URI: http://hdl.handle.net/11536/4869
ISSN: 0013-4651
期刊: JOURNAL OF THE ELECTROCHEMICAL SOCIETY
Volume: 131
Issue: 4
起始頁: 875
結束頁: 877
顯示於類別:期刊論文


文件中的檔案:

  1. A1984SL25600036.pdf