Title: THE EFFECTS OF THERMAL NITRIDATION CONDITIONS ON THE RELIABILITY OF THIN NITRIDED OXIDE-FILMS
Authors: TSAI, HH
WU, LC
WU, CY
HU, CM
工學院
College of Engineering
Issue Date: 1-Apr-1987
URI: http://hdl.handle.net/11536/4649
ISSN: 0741-3106
Journal: IEEE ELECTRON DEVICE LETTERS
Volume: 8
Issue: 4
Begin Page: 143
End Page: 145
Appears in Collections:Articles


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  1. A1987G609400006.pdf