標題: Off-axis unbalanced magnetron sputtering of YBa2Cu3O7 thin films
作者: Tsai, WC
Tseng, TY
電子工程學系及電子研究所
Department of Electronics Engineering and Institute of Electronics
關鍵字: unbalanced magnetron;YBCO;thin films;sputtering
公開日期: 1-七月-1997
摘要: An unbalanced magnet assembly is used in DC off-axis sputtering to grow YBa2Cu3O7 superconducting thin films. The assembly with a stronger central magnet than the annular magnet directs plasma to bombard the off-axis substrate, resulting in deteriorated thin films. In contrast, the assembly with a weaker central magnet directs plasma away from the off-axis substrate and results in a film with a higher transition temperature and a smoother surface. Furthermore, the latter type of unbalanced DC magnetron sputtering gives a higher deposition rate and enables the grown film to be uniform in composition on static substrates over a range of 8 cm in length. These results reveal the feasibility of using the unbalanced magnetron for thin film growth.
URI: http://hdl.handle.net/11536/448
ISSN: 0254-0584
期刊: MATERIALS CHEMISTRY AND PHYSICS
Volume: 49
Issue: 3
起始頁: 229
結束頁: 233
顯示於類別:期刊論文


文件中的檔案:

  1. A1997XP59600007.pdf