標題: ORIGIN OF THE ENHANCEMENT OF NEGATIVE DIFFERENTIAL RESISTANCE AT LOW-TEMPERATURES IN DOUBLE-BARRIER RESONANT TUNNELING STRUCTURES
作者: WU, JS
CHANG, CY
LEE, CP
WANG, YH
KAI, F
電控工程研究所
Institute of Electrical and Control Engineering
公開日期: 1-七月-1989
URI: http://dx.doi.org/10.1109/55.29659
http://hdl.handle.net/11536/4336
ISSN: 0741-3106
DOI: 10.1109/55.29659
期刊: IEEE ELECTRON DEVICE LETTERS
Volume: 10
Issue: 7
起始頁: 301
結束頁: 303
顯示於類別:期刊論文


文件中的檔案:

  1. A1989AD91400006.pdf