標題: KEV ION-BEAM-EXPOSED POLY(METHYLISOPROPENYLKETONE) AND POLY(PHENYLISOPROPENYLKETONE)
作者: LOONG, WA
PENG, NT
交大名義發表
應用化學系
National Chiao Tung University
Department of Applied Chemistry
關鍵字: ION BEAM;POLY(METHYLISOPROPENYLKETONE);POLY(PHENYLISOPROPENYLKETONE);DEVELOPMENT DEPTH
公開日期: 1-Mar-1991
摘要: The exposure characteristics of poly(methylisopropenylketone) (PMIPK) and poly(phenylisopropenylketone) (PPIPK) exposed to 40 and 80 keV H+ and B+ ion beams have been studied. It is found that the electron-rich phenyl group in PPIPK has increased stopping power for the bigger B+ ion, but not for the smaller H+ ion. For the same reason, the main chain scissioning of PPIPK is slower than that of PMIPK when they are exposed to B+, but not to H+, under the same exposure conditions. Linear relationships are found with simulation parameter A which stands for exposure efficiency of the ion beam as a function of exposure doses (keV x ion fluence) for a specific ion-exposed polymer within the used energy range.
URI: http://hdl.handle.net/11536/3853
ISSN: 0021-4922
期刊: JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
Volume: 30
Issue: 3
起始頁: 603
結束頁: 607
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  1. A1991FD92100041.pdf