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dc.contributor.authorLagutchev, ASen_US
dc.contributor.authorSong, KJen_US
dc.contributor.authorHuang, JYen_US
dc.contributor.authorYang, PKen_US
dc.contributor.authorChuang, TJen_US
dc.date.accessioned2014-12-08T15:01:07Z-
dc.date.available2014-12-08T15:01:07Z-
dc.date.issued1998-01-15en_US
dc.identifier.issn0301-0104en_US
dc.identifier.urihttp://hdl.handle.net/11536/33-
dc.description.abstractInfrared-visible sum frequency generation (SFG) vibrational spectroscopy in the C-H stretching region was used to study a set of self-assembled monolayers, formed from octyltrichlorosilane [CH3(CH2)(7)SiCl3], its partially fluorinated analog, (tridecafluoro-1,1,2,2-tetrahydrooctyl)-1-trichlorosilane [CF3-(CF2)(5)(CH2)(2)SiCl3] and their mixtures. SFG measurements were complemented with transmission-absorption FTIR spectroscopy and X-ray photoemission spectroscopy. Simultaneous self-assembly of both chlorosilanes results in preferential deposition of the fluorinated compound. The major reason for this behavior is the alkyl chain fluorination. There is a strong spectroscopic evidence of close coadsorption of fluorinated and non-fluorinated molecules in mixed monolayers. It follows that the species in self-assembled monolayers of binary composition do not segregate into different phases as it is observed for similar Langmuir-Blodgett films. Distinct differences found in SFG spectra of fluorinated and non-fluorinated samples indicate that SFG spectroscopy is much more sensitive than FTIR in detection of symmetry distortions in the alkyl chain of the amphiphiles. Both SFG and FTIR spectroscopic data show the presence of hydrocarbon residue in fluorinated and mixed films that is very likely due to hexadecane used as a solvent during monolayer deposition. (C) 1998 Elsevier Science B.V.en_US
dc.language.isoen_USen_US
dc.titleSelf-assembly of alkylsiloxane monolayers on fused silica studied by XPS and sum frequency generation spectroscopyen_US
dc.typeArticleen_US
dc.identifier.journalCHEMICAL PHYSICSen_US
dc.citation.volume226en_US
dc.citation.issue3en_US
dc.citation.spage337en_US
dc.citation.epage349en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000072161800008-
dc.citation.woscount25-
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