標題: POLY-OXIDE POLY-SI/SIO2/SI STRUCTURE FOR ELLIPSOMETRY MEASUREMENT
作者: CHAO, TS
LEE, CL
LEI, TF
YEN, YT
電子工程學系及電子研究所
Department of Electronics Engineering and Institute of Electronics
關鍵字: MEASUREMENT;THIN FILMS;ELLIPOSOMETRY
公開日期: 4-六月-1992
摘要: A multiple poly-oxide/poly-Si/SiO2/Si sandwiched structure is proposed for the conventional single incident angle and single wavelength ellipsometry measurement of the thicknesses and refractive indices of the poly-oxide and the poly-Si at the same time. The structure is simple and gives accurate results.
URI: http://hdl.handle.net/11536/3385
ISSN: 0013-5194
期刊: ELECTRONICS LETTERS
Volume: 28
Issue: 12
起始頁: 1144
結束頁: 1145
顯示於類別:期刊論文


文件中的檔案:

  1. A1992HY58100042.pdf