標題: Direct determination of azimuth angles in photoelastic modulator system
作者: Chao, YF
Wang, CK
光電工程學系
Department of Photonics
關鍵字: ellipsometry;polarimetry;phase modulation
公開日期: 1-六月-1998
摘要: Instead of the nulling method, a high-level intensity technique is proposed to determine the relative azimuth orientation of a photoelastic modulator and an analyzer. In a photoelastic modulating system, one can obtain a DC intensity distribution by varying the phase modulation amplitude at two azimuth angles of the analyzer, which are pi/4 apart from each other. The relative azimuth orientation can be determined by taking the ratio of the slopes of these two intensity distributions around the linear region of the zero point of the zero-order Bessel function. A similar technique is also applicable to wave plates for aligning their optical axes with the system.
URI: http://dx.doi.org/10.1143/JJAP.37.3558
http://hdl.handle.net/11536/32598
ISSN: 0021-4922
DOI: 10.1143/JJAP.37.3558
期刊: JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
Volume: 37
Issue: 6A
起始頁: 3558
結束頁: 3562
顯示於類別:期刊論文


文件中的檔案:

  1. 000074990000075.pdf