標題: Alignment error evaluation of the dial pattern
作者: Chang, YH
Huang, YC
電子工程學系及電子研究所
Department of Electronics Engineering and Institute of Electronics
公開日期: 1-九月-1998
摘要: To achieve smooth etched sidewall surface at minimal time expense and reduce undercut etching are basic disciplines of the task of accurate alignment. When aligning etch-masks to [110] crystal orientation on a [100] Si wafer, a consideration is proposed by Schroder who uses a dial pattern for pre-etching to determine [110] crystal orientation. But that performance depends strongly on the resolution of the mask pattern generator. In this paper, we analyse Schroder's method by mathematical modeling and computer simulation. Finally, we propose an improvement for the Schroder limitation according to our analytic results.
URI: http://dx.doi.org/10.1088/0960-1317/8/3/010
http://hdl.handle.net/11536/32426
ISSN: 0960-1317
DOI: 10.1088/0960-1317/8/3/010
期刊: JOURNAL OF MICROMECHANICS AND MICROENGINEERING
Volume: 8
Issue: 3
起始頁: 239
結束頁: 242
顯示於類別:期刊論文


文件中的檔案:

  1. 000076105300010.pdf