標題: Influence of thermal boundary resistance on bolometric response of high-T-c superconducting films
作者: Wu, JP
Shih, CU
Chu, HS
機械工程學系
Department of Mechanical Engineering
關鍵字: bolometer;thermal boundary resistance;voltage response
公開日期: 1-九月-1998
摘要: This work presents a thermal analysis on predicting the temperature increase and the voltage response of high-T-c superconducting bolometers. To consider the thermal boundary resistance between film and substrate, an acoustic mismatch model (AMM), a diffusive mismatch model (DMM), and an interfacial layer model (ILM) are employed. The thermal boundary resistance significantly influences the voltage response. Additionally, several common substrates are examined. SrTiO3 (100) or LaAlO3 (100) is a better substrate for high-T-c superconducting bolometers. Furthermore, we demonstrated that there are several factors to affect the voltage response, such as the pulse duration for a constant total incident energy or a fixed highest incident heat flux, the pulse distribution function in time, optical penetration depth, the thermal conductivities of the film and substrate, initial operating temperature, thickness ratio, and the amount of incident heat flux. One interesting finding was that when compared with experimental data, all the theoretical values from the present study as well as the other previously theoretical treatment overestimate the voltage response near the transition temperature. (C) 1998 Elsevier Science Ltd. All rights reserved.
URI: http://hdl.handle.net/11536/32405
ISSN: 0011-2275
期刊: CRYOGENICS
Volume: 38
Issue: 9
起始頁: 881
結束頁: 892
顯示於類別:期刊論文


文件中的檔案:

  1. 000076972100004.pdf