標題: CMOS-MEMS Based Optical Electrostatic Phase Shifter Array With Low Driving Voltage and High Fill Factor
作者: Chiou, Jin-Chern
Hung, Chen-Chun
Shieh, Li-Jung
電機工程學系
電控工程研究所
Department of Electrical and Computer Engineering
Institute of Electrical and Control Engineering
關鍵字: CMOS MEMS;MEMS;micromirror;MOEMS;phase shifter
公開日期: 1-Sep-2010
摘要: This work develops a novel 4 x 4 optical phase shifting micromirror array that achieves a lambda/4 vertical displacement and makes the mirror peak-to-valley deformation within lambda/10 (514 nm light source). Each individual micromirror pixel is controllable and driven by an electrostatic parallel plate actuator. The mirror reflective surface is an aluminum layer with a high optical reflectivity exceeding 90%. This device achieves a high fill factor of more than 90% without an additional flip-chip bonding process due to the parallel plate actuator and the hidden suspension beam structures. The phase shifter array is fabricated using the Taiwan Semiconductor Manufacturing Company (TSMC) 0.35 mu m 2p4m CMOS process and post-CMOS process. An in-house post-process is utilized to reserve a 40 mu m thick bulk-silicon under the 200 mu m x 200 mu m mirror. This eliminates mirror deformation from residual stress after the device is released. The micromirror demonstrates a vertical displacement of lambda/4 at only 3 V and the resonant frequency is 3.6 kHz. Industry can use this phase-shifting micromirror array as a spatial light modulator in holographic data storage systems in the future.
URI: http://dx.doi.org/10.1109/JQE.2010.2043502
http://hdl.handle.net/11536/32204
ISSN: 0018-9197
DOI: 10.1109/JQE.2010.2043502
期刊: IEEE JOURNAL OF QUANTUM ELECTRONICS
Volume: 46
Issue: 9
起始頁: 1301
結束頁: 1308
Appears in Collections:Articles


Files in This Item:

  1. 000289969700001.pdf