標題: Surface wettability of silicon substrates enhanced by laser ablation
作者: Tseng, Shih-Feng
Hsiao, Wen-Tse
Chen, Ming-Fei
Huang, Kuo-Cheng
Hsiao, Sheng-Yi
Lin, Yung-Sheng
Chou, Chang-Pin
機械工程學系
Department of Mechanical Engineering
公開日期: 1-Nov-2010
摘要: Laser-ablation techniques have been widely applied for removing material from a solid surface using a laser-beam irradiating apparatus. This paper presents a surface-texturing technique to create rough patterns on a silicon substrate using a pulsed Nd:YAG laser system. The different degrees of microstructure and surface roughness were adjusted by the laser fluence and laser pulse duration. A scanning electron microscope (SEM) and a 3D confocal laser-scanning microscope are used to measure the surface micrograph and roughness of the patterns, respectively. The contact angle variations between droplets on the textured surface were measured using an FTA 188 video contact angle analyzer. The results indicate that increasing the values of laser fluence and laser pulse duration pushes more molten slag piled around these patterns to create micro-sized craters and leads to an increase in the crater height and surface roughness. A typical example of a droplet on a laser-textured surface shows that the droplet spreads very quickly and almost disappears within 0.5167 s, compared to a contact angle of 47.9A degrees on an untextured surface. This processing technique can also be applied to fabricating Si solar panels to increase the absorption efficiency of light.
URI: http://dx.doi.org/10.1007/s00339-010-5821-y
http://hdl.handle.net/11536/32046
ISSN: 0947-8396
DOI: 10.1007/s00339-010-5821-y
期刊: APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING
Volume: 101
Issue: 2
起始頁: 303
結束頁: 308
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