標題: Electron-electron scattering times in low-diffusivity thick RuO2 and IrO2 films
作者: Lin, JJ
Xu, W
Zhong, YL
Huang, JH
Huang, YS
物理研究所
Institute of Physics
公開日期: 1-一月-1999
摘要: We have systematically measured the electron dephasing scattering times from a three-dimensional weak-localization study of low-diffusivity thick RuO2 and IrO2 films. We find that the inelastic electron scattering rate 1/tau(in) varies essentially Linearly with the temperature and there is essentially no dependence of 1/tau(in) on the electron elastic mean free path. This observation is understood in terms of the current theoretical concept for electron-electron scattering in strongly disordered bulk conductors. [S0163-1829(99)02601-6].
URI: http://hdl.handle.net/11536/31590
ISSN: 0163-1829
期刊: PHYSICAL REVIEW B
Volume: 59
Issue: 1
起始頁: 344
結束頁: 348
顯示於類別:期刊論文