標題: Photostabilization of an epoxy resin by forming interpenetrating polymer networks with bisphenol-A diacrylate
作者: Lin, MS
Wang, MW
Cheng, LA
應用化學系
Department of Applied Chemistry
關鍵字: IPN;aging;photostabilization;chain scission
公開日期: 1999
摘要: Bisphenol-A diacrylate (BADA) was synthesized from the reaction of bisphenol-A and acrylol chloride. Interpenetrating polymer networks (IPNs) based on diglycidyl ether of bisphenol-A. (DGEBA) and BADA in weight ratios of DGEBA/BADA = 100/0, 75/25 and 50/50 were prepared by using 4,4'-diaminodiphenylmethane (MDA) and benzoyl peroxide (BPO) as curing agents. Samples were irradiated with ultraviolet in a Q-WA weather-o-meter to study their aging behavior. Experimental results indicated that the BADA thus incorporated in the IPN structure confers significant photostabilization of the epoxy, as shown by less chain scission at C-O-C in the epoxy, with less property loss in mechanical tests. (C) 1999 Elsevier Science Ltd. All rights reserved.
URI: http://hdl.handle.net/11536/31588
http://dx.doi.org/10.1016/S0141-3910(99)00085-3
ISSN: 0141-3910
DOI: 10.1016/S0141-3910(99)00085-3
期刊: POLYMER DEGRADATION AND STABILITY
Volume: 66
Issue: 3
起始頁: 343
結束頁: 347
顯示於類別:期刊論文


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  1. 000083330200006.pdf