標題: Electron inelastic interactions with overlayer systems
作者: Kwei, CM
Chiou, SY
Li, YC
電子工程學系及電子研究所
Department of Electronics Engineering and Institute of Electronics
公開日期: 15-六月-1999
摘要: An overlayer system composed of a thin film on the top of a semi-infinite substrate was studied in this work for electron inelastic interactions. Analytical expressions for the depth-dependent inelastic differential and integral inverse mean free paths were derived for both incident and escaping electrons. The interface (film-substrate) effect and the surface (vacuum-film) effect were analyzed by comparing the results of an overlayer system and a semi-infinite system. It was found that the interface effect extended to several angstroms on both sides of the interface for a 500 eV electron incident into or escaping from the vacuum-SiO2-Si and the vacuum-Au-Ni systems. An application of the spatial-varying inelastic differential inverse mean free paths was made by Monte Carlo simulations of the electron elastic backscattering from an overlayer system. Good agreement was found between results calculated presently and data measured experimentally on the elastic reflection coefficient. (C) 1999 American Institute of Physics. [S0021-8979(99)00712-4].
URI: http://hdl.handle.net/11536/31279
ISSN: 0021-8979
期刊: JOURNAL OF APPLIED PHYSICS
Volume: 85
Issue: 12
起始頁: 8247
結束頁: 8254
顯示於類別:期刊論文


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