標題: A direct determination technique for azimuth alignment in photoelastic modulation ellipsometry
作者: Chao, YF
Wang, CK
Liu, S
光電工程學系
Department of Photonics
關鍵字: ellipsometry;alignment;photoelastic modulator
公開日期: 1-十二月-1999
摘要: Instead of the nulling method, a three-intensity-measurement technique is proposed to determine the azimuth deviation of the polarizer (P), photoelastic modulator (PEM) and analyzer (A) with respect to the specimen surface for ellipsometric measurements. After the initial alignment in a straight-through setup, we adjusted the azimuth of P at 45 degrees to the strain axis of the PEM. Arranging a Polarizer-PEM-Sample-Analyzer ellipsometer by subjecting a specimen at the required incident angle, we measured a set of three DC radiances at the zero point of the zero-order Bessel function. In addition to the azimuth deviation, the ellipsometric parameter can also be determined from the same measurements.
URI: http://dx.doi.org/10.1143/JJAP.38.6919
http://hdl.handle.net/11536/30938
ISSN: 0021-4922
DOI: 10.1143/JJAP.38.6919
期刊: JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
Volume: 38
Issue: 12A
起始頁: 6919
結束頁: 6922
顯示於類別:期刊論文


文件中的檔案:

  1. 000084519700071.pdf