標題: Low contact resistance of poly-plug structure by in-situ HF-vapour cleaning
作者: Chen, JH
Lei, TF
Chao, TS
Su, TP
Huang, SJ
Tuan, A
Chen, SK
電子工程學系及電子研究所
Department of Electronics Engineering and Institute of Electronics
公開日期: 13-四月-2000
摘要: A low contact-resistance poly-plug structure realised by in-situ HF-vapour cleaning in a clustered tool is described. The native oxide in the contact area can be efficiently removed by the combination of an HF-dipping and in-situ HF-vapour cleaning process, resulting in a low specific contact resistance.
URI: http://dx.doi.org/10.1049/el:20000580
http://hdl.handle.net/11536/30583
ISSN: 0013-5194
DOI: 10.1049/el:20000580
期刊: ELECTRONICS LETTERS
Volume: 36
Issue: 8
起始頁: 756
結束頁: 757
顯示於類別:期刊論文


文件中的檔案:

  1. 000086845500042.pdf